SAN FRANCISCO — Germany's Leica Microsystems Inc. took the Semicon West trade show to launch its new electron-beam, direct-write tool for use in addressing technologies down to the 65-nm node. The ...
SANTA CLARA, Calif. – During the SPIE Microlithography conference here, IBM Corp. and Nikon Corp. announced demonstration of a “real” wafer exposure tool, based on electron-beam projection lithography ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results